Plasma is a gaseous mixture of negativerly charged electrons and highly charged ions created by electro-magnetic field and it is applied as essential core technology for film deposition, etching and surface functionalization in manufacturing of value-added products including devices, components and equipments for prospective industries including semiconductor, flat panel displays, digital electronics etc. Plasma is a complex phenomion that the movement of particles and ions mutually influences electromagnetic field. In plasma states, the temperature of gas particles can be measured very different because the neutral, ions, electrons have different mobility in electromagnetic fields. Also the collisions between the particles occurs constantly which cause a plasma reaction (ionization, excitation, etc) as well as chemical reaction. Calculation of the plasma with direct simulation based on particle-based method requires large amount of computational time. Therefore, the grid-based plasma flow analysis regards that the nature of the ions and electrons as two or more fluids. But basically plasma is composed of particles and it is essentially based on the analysis of particle method to correctly interpret the plasma reaction due to the collisions between these particles. More advanced plasma analysis is available due to high-speed electromagnetic field analysis capabilities and particle-based gas analysis solution of samadii/plasma based on the GPU.
Copyrights © METARIVER TECHNOLOGY co., ltd. All rights reserved.